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Plasma Lithography Surface Patterning for Creation of Cell Networks
Published on: June 14, 2011
F Behboodi-Sadabad1, V Trouillet, A Welle
1Institute of Organic Chemistry (IOC) , Karlsruhe Institute of Technology (KIT) , 76131 Karlsruhe , Germany.
Resorcin[4]arenes offer a novel approach to surface modification, creating uniform nanocoatings with tunable functionalities. This method overcomes limitations of traditional phenolic compounds for advanced material applications.
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