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Updated: Feb 3, 2026

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
Published on: August 19, 2016
Controlling of Electrospray Deposition for Micropatterns
Jiaxin Jiang1,2,3, Gaofeng Zheng4,5,6, Ping Zhu7,8,9
1Department of Instrumental and Electrical Engineering, Xiamen University, Xiamen 361005, China. jiangjx@xmu.edu.cn.
Abstract:
Based on the electrohydrodynamic (EHD) theory, a novel method of near-field electrospray is proposed to fabricate micropatterns with micro/nano-scale particles. Compared with conventional electrospray technology, the deposition area can be decreased to print a regular pattern according to the moving trajectory of the substrate by shortening the distance between the nozzle and the collector to several millimeters in near-field electrospray. The controlling strategies in the near-field electrospray deposition process were investigated. The line width of printed pattern increased with the increase of applied voltage, deposition time, and flow rate of solution. However, it decreased with the increase of motion velocity of the substrate. By applying a suitable matching of electrospray parameters, the regular patterns with a line width under 500 μm were printed controllably on the substrate. Thereby, atomized particles from near-field electrospray were successfully deposited in specific patterns. Characters of '2', '7', and '9' with uniform width and steady shape were patterned. This work provides an excellent way to promote the precision integrated manufacturing of electronic system.
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