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Squeeze Film Air Damping in Tapping Mode Atomic Force Microscopy
Yang Zhao1,2, Qiangxian Huang3, Liansheng Zhang4
1School of Instrument Science and Opto-electronics Engineering, Hefei University of Technology, Hefei 230009, China. zhaoyang@ahjzu.edu.cn.
Micromachines
|November 8, 2018
Summary
Squeeze film air damping affects nanoscale patterning accuracy in dynamic plowing lithography. This study models damping effects on cantilever vibrations, improving nanopatterning precision.
Area of Science:
- Atomic Force Microscopy
- Nanofabrication
- Fluid Dynamics
Background:
- Dynamic plowing lithography uses vibrating atomic force microscopy tips for nanoscale patterning.
- Small tip-sample gaps in this process create squeeze film air damping.
- This damping impacts cantilever dynamics and patterning accuracy.
Purpose of the Study:
- To model and analyze squeeze film air damping in dynamic plowing lithography.
- To investigate the influence of cantilever inclination on damping effects.
- To understand how damping affects cantilever resonant amplitude and damping coefficient.
Main Methods:
- Developing a model for squeeze film air damping.
- Analyzing the effects of cantilever inclination angle.
- Simulating cantilever dynamics under damping conditions.
- Observing damping effects during cantilever approach curves.
Main Results:
- Squeeze film air damping significantly influences cantilever vibrating parameters.
- Inclined cantilever angles alter damping effects on resonant amplitude and damping coefficient.
- Observed damping effects during approach curves correlate with patterning inaccuracies.
Conclusions:
- Accurate modeling of squeeze film air damping is crucial for precise nanoscale patterning.
- Understanding damping mechanisms enhances control over lithography processes.
- This research provides insights for improving the accuracy of dynamic plowing lithography.
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