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Structural and Fluorine Plasma Etching Behavior of Sputter-Deposition Yttrium Fluoride Film

Wei-Kai Wang1, Yu-Xiu Lin2, Yi-Jie Xu3

  • 1Department of Materials Science and Engineering, Da-Yeh University, Changhua 51591, Taiwan. wk@mail.dyu.edu.tw.

Nanomaterials (Basel, Switzerland)
|November 17, 2018
PubMed

Keywords:
filmsplasma processing equipmentyttrium fluoride

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