Control of thermal radiation in metal hole array structures formed by anisotropic anodic etching of Al
Abstract:
An efficient preparation process for Al hole array structures emitting wavelength-selective thermal radiation that is based on the anisotropic anodic etching of Al was demonstrated. The formation of an ordered hole array was achieved by a masking process prior to the anodic etching. The present process allows the preparation of large samples because the masking of the Al foil has a high throughput owing to the simple printing process using a flexible stamp. The thermal radiation properties of the Al hole array could be controlled by adjusting the depth and aperture size of the holes.
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