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Athermal echelle grating filter in silicon-on-insulator using a temperature-synchronized input.

Daniele Melati, Pierre G Verly, André Delâge

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    This study presents a novel athermal echelle grating filter design for silicon photonics. The new design significantly reduces spectral shift over temperature changes, enhancing the stability of photonic integrated circuits.

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    Area of Science:

    • Photonics
    • Integrated Optics
    • Optical Engineering

    Background:

    • Athermal design in silicon photonics reduces energy consumption by minimizing active temperature stabilization.
    • Traditional methods using cladding materials are ineffective for echelle grating filters due to small modal overlap.
    • Echelle grating filters are crucial optical components in photonic integrated circuits.

    Purpose of the Study:

    • To develop an athermal echelle grating filter for silicon photonic devices.
    • To overcome the limitations of existing athermal design approaches for echelle gratings.
    • To improve the thermal stability and reduce spectral shift in photonic integrated circuits.

    Main Methods:

    • Designing an echelle grating filter with a temperature-synchronized Mach-Zehnder interferometer as input.
    • Utilizing standard silicon-on-insulator fabrication processes.
    • Analyzing modal overlap and thermo-optic effects within the filter design.

    Main Results:

    • Achieved a spectral shift of less than ±45 pm over a 20 K temperature range.
    • Demonstrated a significant reduction in spectral shift compared to conventional echelle grating inputs (1.6 nm).
    • Confirmed good tolerance to fabrication uncertainties using standard processes.

    Conclusions:

    • The proposed athermal echelle grating filter design offers superior thermal stability.
    • This advancement is crucial for energy-efficient and reliable photonic integrated circuits.
    • The design is compatible with existing silicon photonic fabrication technologies.