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    This study introduces a novel pixel-by-pixel reference calibration for stitching interferometry, eliminating the need for high-quality reference optics. The method effectively suppresses reference errors and form errors in aspheric surfaces.

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    Area of Science:

    • Optical Engineering
    • Metrology
    • Interferometry

    Background:

    • Subaperture stitching interferometry is crucial for measuring large and complex optical surfaces.
    • Reference errors in stitching interferometry can significantly impact measurement accuracy.
    • Existing methods often require high-quality reference optics or complex calibration procedures.

    Purpose of the Study:

    • To propose and validate a pixel-by-pixel reference calibration method for vibration modulated stitching interferometry.
    • To eliminate the need for dedicated reference calibration procedures and high-quality reference optics.
    • To improve the accuracy and efficiency of aspheric surface metrology.

    Main Methods:

    • Utilizing vibration modulated stitching interferometry to acquire high-density overlapping subaperture phases.
    • Implementing a pixel-by-pixel reference calibration based on the averaged difference between stitched and compensated phases.
    • Performing measurements and reference calibration within a single phase stitching process.

    Main Results:

    • Demonstrated the feasibility of the proposed method through simulations and experimental validation.
    • Successfully suppressed high-frequency reference errors.
    • Showcased effective correction of most third-order Zernike form errors.

    Conclusions:

    • The proposed pixel-by-pixel reference calibration method significantly simplifies the stitching interferometry process.
    • This approach reduces reliance on expensive and high-precision reference optics.
    • The method offers a practical solution for accurate metrology of aspheric optical components.