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Additive Manufacturing-Enabled Low-Cost Particle Detector
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Charged particle single nanometre manufacturing.

Philip D Prewett1, Cornelis W Hagen2, Claudia Lenk3

  • 1Oxford Scientific Consultants Ltd, 67 High Street, Dorchester-on-Thames, OX10 7HN, UK.

Beilstein Journal of Nanotechnology
|December 1, 2018
PubMed
Summary
This summary is machine-generated.

Three advanced charged-particle beam nanopatterning technologies, including helium ion beam lithography, focused electron induced processing (FEBIP), and field emission electron scanning probe lithography (FE-eSPL), offer precise nanoscale manufacturing solutions.

Keywords:
charged particle beamselectronfield emissionionnanolithography

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Physics

Background:

  • Electron beam lithography evolved from scanning electron microscopy.
  • Recent advancements focus on single nanometer manufacturing beyond CMOS.
  • Charged-particle beam technologies are crucial for nanoscale fabrication.

Purpose of the Study:

  • To review three state-of-the-art charged-particle beam nanopatterning technologies.
  • To highlight their capabilities and potential applications in nanomanufacturing.
  • To discuss advancements within the EU Project 'Single Nanometre Manufacturing: Beyond CMOS'.

Main Methods:

  • Scanning helium ion beam lithography utilizing fullerene resist for sub-nanometer patterning.
  • Focused electron induced processing (FEBIP) with nozzle-dispensed precursor gas for resistless etching or deposition.
  • Field emission electron scanning probe lithography (FE-eSPL) operating in ambient air without vacuum.

Main Results:

  • Helium ion beam lithography achieved a minimum linewidth of 6 nm with minimal proximity effect.
  • FEBIP demonstrates resistless nanoscale patterning and potential for high throughput with multi-beam systems.
  • FE-eSPL enables sub-10 nm patterning in ambient air, suitable for nanoimprint lithography templates.

Conclusions:

  • These three technologies represent significant progress in charged-particle beam nanopatterning.
  • They offer distinct advantages for high-throughput, high-resolution nanoscale manufacturing.
  • Potential applications include nanoimprint lithography and advanced semiconductor fabrication.