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Polymer-based X-ray masks patterned by direct laser writing.

Sven Achenbach1, Garth Wells2, Michael Jacobs1

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|December 4, 2018
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Summary
This summary is machine-generated.

This study presents a cost-effective method for fabricating high-quality X-ray masks using UV-laser exposure and electroplating. This advancement enhances the availability and affordability of masks for deep X-ray lithography (XRL).

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Lithography

Background:

  • Affordable and high-quality X-ray masks are crucial for deep X-ray lithography (XRL).
  • Current fabrication technologies limit the widespread adoption of XRL due to mask availability and cost.

Purpose of the Study:

  • To develop an alternative, cost-efficient fabrication process for X-ray lithography (XRL) masks.
  • To improve the availability and structure quality of XRL masks.

Main Methods:

  • A 355 nm UV-laser exposes SU-8 resist on a copper substrate.
  • Two-step electroplating fills voids with nickel and gold absorbers.
  • A second SU-8 layer forms the 40 μm mask membrane.

Main Results:

  • Achieved absorber structure accuracy of approximately 1 μm.
  • Fabricated masks enable XRL of resists up to 200 μm thickness.
  • Resulting PMMA microstructures exhibit smooth, vertical sidewalls with minimal thermal deformation.

Conclusions:

  • The developed process significantly improves XRL mask availability and cost-efficiency.
  • This method supports the widespread use of deep X-ray lithography for microfabrication.
  • The masks demonstrate high precision suitable for patterning advanced microstructures.