Controlled TiO2 Growth on Reverse Osmosis and Nanofiltration Membranes by Atomic Layer Deposition: Mechanisms and

Xuechen Zhou1,2, Yang-Ying Zhao1,3, Sang-Ryoung Kim1

  • 1Department of Chemical and Environmental Engineering , Yale University , New Haven , Connecticut 06511 , United States.

Summary

Atomic layer deposition (ALD) of titanium dioxide (TiO2) on thin-film composite (TFC) membranes offers precise surface modification. Fewer than 10 ALD cycles enhance RO membrane surface charge and NF membrane solute rejection without performance loss.

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