Triaxially uniform high-quality Al _x Ga_(1-x)N (x ∼ 50%) nanowires on template free sapphire substrate

We have demonstrated the growth of high-quality Al _x Ga_(1-x)N (x ∼ 50%) nanowires (NWs) for the first time on the sapphire substrate without using GaN NWs as the template, by plasma-assisted molecular beam epitaxy. Our newly developed process elucidates that depending on the substrate temperature and V/III ratio an AlGaN network is formed on sapphire substrate prior to the NWs growth. We find that the ledges of this kinked shaped network act as nucleation sites for the NW growth. The present observations suggest that availability of nucleation sites and higher substrate temperature during growth are the key parameters for the growth of homogeneous AlGaN NWs on the sapphire substrates. Energy dispersive x-ray spectroscopy, high-resolution transmission electron microscopy, Raman spectroscopy, x-ray diffraction, photoluminescence spectroscopy, and scanning electron microscopy analysis show that AlGaN NWs exhibit near-atomic scale compositional uniformity along the length as well as across the diameter.