Two-Photon Lithographic Patterning of DNA-Coated Single-Microparticle Surfaces

Area of Science:

• Materials Science
• Nanotechnology
• Biotechnology

Background:

• Spatially defined functionalization of microparticles with asymmetric nucleic acid patterns is challenging.
• Asymmetric patterning is crucial for controlled fabrication of crystalline lattices and aggregates.

Purpose of the Study:

• To present a versatile method for asymmetrically patterning single microparticle surfaces.
• To demonstrate the fabrication of complex, multi-domain asymmetric nucleic acid patterns.

Main Methods:

• Combination of two-photon lithography and photocleavable o-nitrobenzylphosphate ester nucleic acid coating.
• Controlled Z-positioning of microparticles relative to two-photon irradiation sources.

Main Results:

• Demonstrated two-photon patterning of microparticles with nucleic acid structures (700 nm to 2.8 μm) in various shapes.
• Fabricated complex patterned domains with two different asymmetric nucleic acid domains.
• Generated functional nucleic acid domains for photostimulated activation of catalytic hybridization assembly (CHA).

Conclusions:

• The developed method offers a versatile approach for asymmetric microparticle surface patterning.
• This technique enables the creation of precisely controlled nucleic acid functionalization on microparticles.
• The patterned microparticles can be used for advanced applications like controlled self-assembly and catalysis.