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Plasmonic roller lithography.

Xi Chen1, Sung Ho Lee2,3, Cheng Zhang4

  • 1Applied Physics, University of Michigan, Ann Arbor, MI 48109, United States of America.

Nanotechnology
|January 19, 2019
PubMed
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A novel plasmonic roller system integrates flexible photomasks with rotating quartz cylinders for continuous, large-area patterning. This technology enables cost-effective, large-scale production of electronic and photonic devices with deep sub-wavelength resolution.

Area of Science:

  • Nanotechnology
  • Materials Science
  • Photonics

Background:

  • Photo roller lithography offers continuous large-area patterning using flexible photomasks on rotating quartz cylinders.
  • Plasmonic lithography achieves deep sub-wavelength resolution via evanescent waves with high spatial frequency components.

Purpose of the Study:

  • To demonstrate a plasmonic roller system by integrating a quartz mechanical roller with a specially designed photomask.
  • To achieve continuous, deep sub-wavelength patterning over large areas.

Main Methods:

  • Integration of a quartz mechanical roller with a photomask based on plasmonic waveguide lithography.
  • Continuous printing of patterns on a moving substrate.

Main Results:

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  • Demonstration of a plasmonic roller system capable of continuous patterning.
  • Achievement of deep sub-wavelength uniform patterns with high aspect ratios over a moving substrate.

Conclusions:

  • The plasmonic roller system successfully combines the advantages of roller lithography and plasmonic lithography.
  • This system holds potential for cost-effective, large-scale manufacturing of advanced electronic and photonic devices.