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Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering

Song Zhang1, Tingting Wang2, Ziyu Zhang3

  • 1State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070, China. superkobe0104@gmail.com.

Materials (Basel, Switzerland)
|February 2, 2019
PubMed

Keywords:
Vanadium filmsmagnetron sputteringmicrostructureoxidation behaviorsubstrate temperature (Ts)target–substrate distance (Dt–s)

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