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Updated: Jan 29, 2026

Author Spotlight: Advancements in High-Performance Thermoelectric Thin Films Through Radio Frequency Magnetron Sputtering
Published on: May 17, 2024
Structural, chemical and mechanical study of TiAlV film on UHMWPE produced by DC magnetron sputtering
J O Berumen1, T De la Mora2, N López-Perrusquia2
1Universidad de Guadalajara-CUCEI, Guadalajara,Jalisco, México.
Abstract:
Ultra High Molecular Weight Polyethylene (UHMWPE), with a semi-trapezoidal topography, and glass samples were coated with a TiAlV film using magnetron sputtering in order to study its structure, chemical composition and the adhesion film properties on the polymer surfaces. The magnetron sputtering is a PVD technique that depending on the deposited parameter produces a coating with structural, chemical and specific topographic characteristics that increase the electrical, mechanical, optical and biological surface properties of the organic compounds. The quantities of Vanadium (V) and Aluminum (Al) were similar to that of Ti64 alloy. The metallic film obtained presents α-Ti phase structure with a (200) preferential orientation. The TiAlV film on polymeric surfaces with semi-trapezoidal topography exhibit irregularities and uncoated zones but on the glass, the metallic coating was smooth and continuous. The scratch tests were carried out using an incremental load configuration with a Tribotechnic scratch tester equipment. The metallic film decreased the viscoelastic recovering of the polymeric surface but increased the load capacity. The metallic film did not present complete delamination but fractures and small zones of coating detachment were observed on all the scratch tracks.
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