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What is Natural Selection?

What is Natural Selection?

Natural selection is an evolutionary process in which individuals with survival-promoting traits reproduce at higher rates. These favorable traits become more common within a population or species. Naturally selected traits initially arise via random genetic mutations. In order for selection to occur, there must be variation within a population, the trait controlling the variation must be heritable, and there must be an evolutionary advantage for variation in the trait.

Antibiotic Selection

Antibiotic Selection

Types of Selection

Types of Selection

Natural selection influences the frequencies of particular alleles and phenotypes within populations in several different ways. Primarily, natural selection can be directional, stabilizing, or disruptive. Directional selection favors one extreme trait and shifts the population towards that phenotype while selecting against individuals displaying alternate traits. Stabilizing selection favors an intermediate trait with a narrow range of variation. Deviation from the optimal phenotype towards an...

Frequency-dependent Selection

Frequency-dependent Selection

When the fitness of a trait is influenced by how common it is (i.e., its frequency) relative to different traits within a population, this is referred to as frequency-dependent selection. Frequency-dependent selection may occur between species or within a single species. This type of selection can either be positive—with more common phenotypes having higher fitness—or negative, with rarer phenotypes conferring increased fitness.

Limits to Natural Selection

Limits to Natural Selection

Organisms that are well-adapted to their environment are more likely to survive and reproduce. However, natural selection does not lead to perfectly adapted organisms. Several factors constrain natural selection.

Natural Selection and Adaptation

Natural Selection and Adaptation

Natural selection, a fundamental concept in evolutionary biology, is the mechanism by which evolution is driven, favoring organisms that are best adapted to their environments. This process enhances their chances of survival and reproduction. Adaptation, a key outcome of this process, involves genetic modifications that optimize an organism's functionality under specific environmental challenges, such as extreme cold or thinner air at high altitudes.
Beyond physical adaptations,...

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Related Experiment Video

Updated: Jan 29, 2026

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Published on: May 23, 2018

From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity.

Adriaan J M Mackus¹, Marc J M Merkx¹, Wilhelmus M M Kessels¹

¹Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands.

Chemistry of Materials : a Publication of the American Chemical Society

|February 19, 2019

Summary

Area-selective atomic layer deposition (ALD) is crucial for advanced semiconductor manufacturing and catalyst synthesis. Improving selectivity involves advanced ALD cycles with integrated surface correction steps to prevent unwanted deposition.

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Area of Science:

Materials Science
Nanotechnology
Chemical Engineering

Background:

Bottom-up nanofabrication using area-selective atomic layer deposition (ALD) is increasingly important for semiconductor processing.
Area-selective ALD addresses edge placement errors inherent in top-down fabrication methods.
This technique also enables precise synthesis of catalysts and other nanomaterials.

Purpose of the Study:

To provide an overview of current advancements in area-selective ALD.
To discuss the challenges associated with achieving high selectivity in ALD processes.
To propose future directions for improving area-selective ALD techniques.

Main Methods:

Review of current literature and developments in area-selective ALD.
Analysis of mechanisms leading to selectivity loss in ALD.
Exploration of strategies for enhancing ALD selectivity, including surface functionalization and selective etching.

Main Results:

Loss of selectivity often occurs due to changes in surface chemistry during ALD exposure.
Correction steps, such as surface functionalization or etching, can restore or improve selectivity.
Advanced ALD cycles combining conventional steps with correction methods are proposed.

Conclusions:

Area-selective ALD is a promising technique for next-generation semiconductor manufacturing and materials synthesis.
Overcoming selectivity challenges requires innovative ALD cycle design incorporating surface modification.
Multistep and supercycle ALD recipes offer a pathway to achieve superior control over deposition patterns.