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Updated: Jan 28, 2026

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Exploring the Properties of Niobium Oxide Films for Electron Transport Layers in Perovskite Solar Cells
Silvia Leticia Fernandes1, Luiz Gustavo Simão Albano2, Lucas Jorge Affonço2
1Department of Chemistry, Federal University of São Carlos (UFSCAR), São Carlos, Brazil.
Abstract:
In this work, niobium oxide films were deposited by reactive magnetron sputtering under different oxygen flow rate and applied as electron transport layer in perovskite solar cells. It was found that the deposition made using 3.5 sccm of oxygen flow resulted in films with better electrical properties which helped the extraction of the photogenerated electrons to the external circuit, improving the Jsc and consequently the device efficiency. In addition, by photoluminescence measurements, we found a better charge transfer from perovskite to TiO2/niobium oxide film deposited at 3.5 sccm of oxygen flow.
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