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Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists
Harikrishnan Vijayamohanan1, Parth Bhide1, Dante Boyd1
1Department of Materials Science and Engineering , Rensselaer Polytechnic Institute , 110 8th Street , Troy , New York 12180 , United States.
Abstract:
We study the effect of the microenvironment on writing chemical patterns into spirothiopyran monolayers over large areas in a single step with light. Surfaces functionalized with photoresponsive spirothiopyran are fabricated by chemically modifying amine-terminated monolayers. The merocyanine isomer selectively participates in a thiol-Michael addition reaction with maleimide-functionalized molecules, rendering these surfaces ideal for fast, mask-less direct writing. The local microenvironment of spirothiopyran is found to strongly influence the kinetics of photoswitching. The quantum yield of ring opening is found to be 17 times faster for spirothiopyran surrounded by a locally charged environment rich in guanidinium diluent molecules as compared to a closed-packed monolayer without diluents. Hydrophilic environments are also found to improve the kinetics of ring closing. Optimization of the diluent concentration leads to dramatic improvements in both contrast and yield of direct writing. This enables the monolayer to be used for maskless two-color photopatterning in which spatial control over patterning is obtained by varying the relative intensity of incident UV and green light. These experiments demonstrate the capacity of spirothiopyran monolayers to serve as a versatile toolbox for rapid, large-area surface functionalization.
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