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Structural and Functional Properties of the Thin Film System Ti-Ni-Si
Matthias Wambach1, Pawel Ziolkowski2, Eckhard Müller2,3
1Chair for MEMS Materials, Institute for Materials, Faculty of Mechanical Engineering , Ruhr University Bochum , Universitaetsstrasse 150 , D-44801 Bochum , Germany.
Abstract:
The thin film system Ti-Ni-Si was investigated using methods of combinatorial materials science. A thin film composition spread library of the system was fabricated using combinatorial magnetron sputtering. The functional properties Seebeck coefficient, electrical resistivity, and luminance were determined using high-throughput characterization techniques. A thin-film phase diagram was established by the assessment of high-throughput X-ray diffraction results. Correlations between composition, phase constitution, and functional properties with focus on the binary composition space are discussed.
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