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Passive filters are utilized to shape the frequency spectrum of signals across a diverse array of applications. These filters, using only passive elements like resistors (R), inductors (L), and capacitors (C), are capable of selectively allowing or blocking certain frequency ranges without the need for external power sources.
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GaN-Based Ultraviolet Passive Pixel Sensor on Silicon (111) Substrate.

Chang-Ju Lee1, Chul-Ho Won2, Jung-Hee Lee3

  • 1School of Electronics Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea. chjlee@knu.ac.kr.

Sensors (Basel, Switzerland)
|March 6, 2019
PubMed
Summary
This summary is machine-generated.

Researchers developed a novel Gallium Nitride (GaN)-based ultraviolet (UV) passive pixel sensor (PPS) by monolithically integrating a UV photodetector and transistor. This advancement offers a pathway for efficient GaN optoelectronic device fabrication.

Keywords:
Schottky-barrier (SB) metal-oxide-semiconductor field-effect transistor (MOSFET)UV image sensorgallium nitride (GaN)passive pixel sensor (PPS)photodetectorultraviolet (UV)

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Area of Science:

  • Materials Science
  • Optoelectronics
  • Semiconductor Physics

Background:

  • Conventional Gallium Nitride (GaN)-based ultraviolet (UV) imaging devices often rely on hybrid integration, involving complex backside substrate etching and wafer-to-wafer bonding.
  • Developing efficient single-pixel sensors is crucial for fabricating advanced array-type pixel sensors.

Purpose of the Study:

  • To develop a GaN-based UV passive pixel sensor (PPS) utilizing a monolithic integration technique.
  • To demonstrate the integration of a GaN metal-semiconductor-metal (MSM) UV photodetector and a Schottky-barrier (SB) metal-oxide-semiconductor field-effect transistor (MOSFET).

Main Methods:

  • Monolithic integration of a GaN MSM UV photodetector and a GaN SB-MOSFET on an epitaxially grown GaN layer on a silicon substrate.
  • Characterization of the fabricated MSM UV sensor for dark current density and UV/visible rejection ratio.
  • Evaluation of the GaN SB-MOSFET performance, including drain current, transconductance, and threshold voltage.
  • Testing the UV PPS response and dark-to-photo contrast ratio under 365-nm UV irradiation.

Main Results:

  • The integrated GaN MSM UV sensor achieved a low dark current density of 3.3 × 10-7 A/cm² and a high UV/visible rejection ratio of 10³.
  • The GaN SB-MOSFET demonstrated normally-off operation with a maximum drain current of 0.5 mA/mm, maximum transconductance of 30 μS/mm, and a threshold voltage of 4.5 V.
  • The developed UV PPS exhibited good UV response and a high dark-to-photo contrast ratio of 10³.

Conclusions:

  • The developed monolithic integration technique successfully combined a GaN UV photodetector and a GaN SB-MOSFET on a silicon substrate.
  • This approach offers a viable method for the monolithic integration of GaN-based optoelectronic devices, potentially simplifying fabrication processes.
  • The demonstrated performance metrics indicate the potential of this integrated device for UV imaging applications.