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A compact tunable quadrupole lens for brighter and sharper ultra-fast electron diffraction imaging
Xi Yang1, Lihua Yu2, Victor Smaluk2
1Brookhaven National Laboratory, Upton, NY, 11973, USA. xiyang@bnl.gov.
Scientific Reports
|March 28, 2019
Summary
We developed a new, affordable electromagnetic lens system for MeV electron beams. This system enables precise control over beam size and divergence, significantly improving imaging quality for ultrafast electron diffraction experiments.
Area of Science:
- Accelerator Physics
- Materials Science
- Electron Microscopy
Background:
- High-quality electron beams are crucial for advanced imaging techniques like ultrafast electron diffraction (UED).
- Previous methods for controlling electron beam properties had limitations in terms of tunability and cost.
- Optimizing beam size and divergence is essential for achieving high-resolution diffraction images.
Purpose of the Study:
- To design and experimentally validate a broadly tunable, low-cost transverse focusing lens system for MeV-energy electron beams.
- To demonstrate independent control over electron beam size and divergence.
- To enhance the quality of Bragg-diffraction images (BDI) for UED experiments.
Main Methods:
- Implementation of an electromagnetic (EM) quadrupole lens system.
- Utilizing the Robust Conjugate Directional Search (RCDS) algorithm for online optimization.
- Employing Bragg-diffraction imaging (BDI) for real-time beam divergence measurement and emittance determination.
Main Results:
- Achieved independent control of beam size and divergence for charges from 1 to 13 pC.
- Maintained a constant transverse beam size of 75 µm across the tested charge range.
- Demonstrated a nearly two-orders-of-magnitude increase in charge density compared to conventional solenoids.
- Enabled real-time measurement of beam divergence, crucial for online optimization.
- Observed significant improvements in BDI, including 3x higher peak intensity and 2x sharper peaks at 13 pC.
Conclusions:
- The developed EM quadrupole lens system offers a cost-effective and versatile solution for MeV electron beams.
- Real-time divergence measurement and optimization capabilities pave the way for advanced applications like single-shot ultrafast electron microscopy (UEM).
- The enhanced BDI quality opens new avenues for ultrafast imaging of material dynamics and molecular processes.
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