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Multiple parametric nanoscale measurements with high sensitivity based on through-focus scanning optical microscopy
1School of Instrumentation and Optoelectronic Engineering, Beihang University, Beijing, China.
This study introduces a robust through-focus scanning optical microscopy (TSOM) system for precise 3D nanoscale measurements. The enhanced TSOM system overcomes optical and mechanical noise, enabling high-volume nanomanufacturing applications.
Area of Science:
- Optical Microscopy
- Nanoscale Metrology
- Optical Engineering
Background:
- Through-focus scanning optical microscopy (TSOM) is valuable for nanoscale measurement but is susceptible to optical and mechanical noise.
- Existing TSOM methods face challenges in sensitivity and application for comprehensive 3D parameter extraction.
Purpose of the Study:
- To investigate the sensitivity and applicability of TSOM for three-dimensional (3D) multiple parameter measurement.
- To develop and validate a robust TSOM system and simulation algorithm capable of overcoming noise interference.
Main Methods:
- A novel TSOM system utilizing objective scanning and a corresponding simulation algorithm were developed.
- Experimental validation was performed on an isolated gold (Au) line, establishing a matching library.
- 3D multiple parameters were extracted by comparing experimental and simulated TSOM images.
Main Results:
- The proposed TSOM system demonstrated robustness against optical and mechanical noises.
- Precise 3D multiple parameter results were successfully extracted for the gold line.
- Fidelity tests confirmed the system's accuracy for through-focus image analysis.
Conclusions:
- The developed TSOM system offers enhanced sensitivity and reliability for 3D nanoscale measurements.
- The system's noise robustness makes it suitable for high-volume nanomanufacturing.
- This advancement facilitates more accurate and efficient nanoscale metrology.
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