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Updated: Jan 26, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Gate-Tunable Graphene-WSe2 Heterojunctions at the Schottky-Mott Limit
Samuel W LaGasse1, Prathamesh Dhakras1, Kenji Watanabe2
1Colleges of Nanoscale Science and Engineering, State University of New York Polytechnic Institute, Albany, NY, 12203, USA.
Abstract:
Metal-semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene-WSe2 p-type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near-ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky-Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.
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