Analysis of Hot Carrier Injection According to Gate Length

In this paper, we analyze hot carrier injection (HCI) in an asymmetric dual gate structure with a charge storage layer. In a floating gate device, holes injected by HCI can move freely in the valence band, since the channel potential is constant. In case of charge trapping layer, however, holes are trapped only in the drain side where impact ionization occurs. Therefore, only small threshold voltage shift occurs because channel formation is enhanced only in the drain side. When the gate length is under 100 nm, trapped holes in the drain side start to control the whole channel. Thus, we expect that HCI into the charge trapping layer can be used as a non-volatile memory (NVM) mechanism in short channel devices.