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    A novel doubled-period grating (DPG) method precisely measures scan angle errors in scanning beam interference lithography (SBIL). This technique achieves high-quality grating fabrication with sub-15 microradian precision.

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    Area of Science:

    • Optics and Photonics
    • Nanofabrication
    • Metrology

    Background:

    • Scanning beam interference lithography (SBIL) is crucial for fabricating micro- and nanostructures.
    • Accurate control of scan angle is essential for high-resolution grating fabrication.
    • Existing methods for measuring scan angle errors in SBIL can be complex and less precise.

    Purpose of the Study:

    • To propose and validate a new method for measuring scan angle errors in SBIL.
    • To enhance the precision and quality of gratings fabricated using SBIL.
    • To provide a reliable metrology tool for advanced lithography.

    Main Methods:

    • Development of a doubled-period grating (DPG) method utilizing a reference grating.
    • Integration of a high-resolution two-dimensional stage and phase-stepping algorithms.
    • Analysis of interferogram phase and phase slope to determine scan angle error.

    Main Results:

    • The DPG method successfully measured scan angle errors in SBIL.
    • A grating mask of 100x100 mm^2 was fabricated to demonstrate feasibility.
    • The scan angle error was measured with a precision better than 12.65 μrad.

    Conclusions:

    • The proposed DPG method is effective for precise scan angle error measurement in SBIL.
    • This technique enables the fabrication of high-quality gratings with improved accuracy.
    • The method offers a significant advancement in metrology for nanolithography.