Off-stoichiometry improves the photostructuring of thiol-enes through diffusion-induced monomer depletion

Thiol-enes are a group of alternating copolymers with highly ordered networks and are used in a wide range of applications. Here, "click" chemistry photostructuring in off-stoichiometric thiol-enes is shown to induce microscale polymeric compositional gradients due to species diffusion between non-illuminated and illuminated regions, creating two narrow zones with distinct compositions on either side of the photomask feature boundary: a densely cross-linked zone in the illuminated region and a zone with an unpolymerized highly off-stoichiometric monomer composition in the non-illuminated region. Using confocal Raman microscopy, it is here explained how species diffusion causes such intricate compositional gradients in the polymer and how off-stoichiometry results in improved image transfer accuracy in thiol-ene photostructuring. Furthermore, increasing the functional group off-stoichiometry and decreasing the photomask feature size is shown to amplify the induced gradients, which potentially leads to a new methodology for microstructuring.