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High-aspect-ratio nanoimprint process chains.

Víctor J Cadarso1, Nachiappan Chidambaram1, Loïc Jacot-Descombes2

  • 1Laboratory for Micro- and Nanotechnology, Research Division Synchrotron Radiation and Nanotechnology, Paul Scherrer Institut, Villigen 5232, Switzerland.

Microsystems & Nanoengineering
|May 7, 2019
PubMed
Summary
This summary is machine-generated.

Two novel fabrication methods create high-aspect-ratio micro/nanostructures for nanophotonics. These techniques enable efficient replication of complex structures, proving suitable for high-volume manufacturing.

Keywords:
2-photon polymerizationOrmocercryo-etchingdirect 6 write laser lithographyhigh aspect ratiomouldingnanoimprint lithographyphotonic nanofences

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Optics

Background:

  • Developing complex micro- and nanostructures is crucial for nanophotonics.
  • High-aspect-ratio structures with smooth vertical sidewalls are particularly challenging to fabricate.

Purpose of the Study:

  • To present and compare novel methods for fabricating masters with high-aspect-ratio micro/nanostructures.
  • To demonstrate the feasibility of these methods for high-volume manufacturing of nanophotonic elements.

Main Methods:

  • Fabrication of master structures using silicon cryo-etching (trenches) and 2-photon polymerization direct laser writing (ridges).
  • Replication using micromoulding into capillaries (MIMIC) process with ultraviolet-curing.

Main Results:

  • Achieved high-aspect-ratio nanostructures (up to 1:28) with smooth vertical sidewalls.
  • Successfully replicated structures in polymers (Ormocers) without residual layers.
  • Demonstrated compatibility with hard and soft materials for replication.

Conclusions:

  • Silicon cryo-etching and 2-photon polymerization are effective for creating masters for high-aspect-ratio nanostructures.
  • The MIMIC process is suitable for replicating these structures, enabling high-volume manufacturing.
  • These techniques offer a viable route for producing complex micro/nanostructures for nanophotonics.