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Direct Evidence for Charge Compensation-Induced Large Magnetoresistance in Thin WTe2
Yaojia Wang1, Lizheng Wang1, Xiaowei Liu1
1National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures , Nanjing University , Nanjing 210093 , China.
Charge compensation is the primary driver of large nonsaturating magnetoresistance (MR) in WTe2 films. Tuning electron and hole concentrations revealed this key mechanism, offering insights for other materials.
Area of Science:
- Condensed Matter Physics
- Materials Science
Background:
- Extremely large nonsaturating magnetoresistance (MR) in WTe2 has been observed.
- The underlying physical mechanism for this phenomenon remains under debate.
Purpose of the Study:
- To explicitly identify the dominant physical origin of large nonsaturating MR in WTe2 films.
- To investigate the role of charge compensation and carrier mobility in MR.
Main Methods:
- In situ tuning of magneto-transport properties in thin WTe2 films.
- Electrostatic doping approach to modify carrier concentrations.
- Analysis of gate dependence and temperature dependence of MR.
Main Results:
- Observed a nonmonotonic gate dependence of MR, peaking at charge balance.
- Achieved a maximum MR of 10600% in thin WTe2 films.
- Demonstrated that charge compensation is the dominant mechanism for large MR.
- Found similar temperature dependence for MR and carrier mobility when charge compensation is maintained.
Conclusions:
- Charge compensation is identified as the dominant mechanism for large nonsaturating MR in WTe2.
- Distinct scattering mechanisms may influence the temperature dependence of magneto-transport properties.
- Provides a pathway for achieving large MR in nonmagnetic materials with electron-hole pockets.
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