Field-Driven Athermal Activation of Amorphous Metal Oxide Semiconductors for Flexible Programmable Logic Circuits and...

Despite extensive research, large-scale realization of metal-oxide electronics is still impeded by high-temperature fabrication, incompatible with flexible substrates. Ideally, an athermal treatment modifying the electronic structure of amorphous metal oxide semiconductors (AMOS) to generate sufficient carrier concentration would help mitigate such high-temperature requirements, enabling realization of high-performance electronics on flexible substrates. Here, a novel field-driven athermal activation of AMOS channels is demonstrated via an electrolyte-gating approach. Facilitating migration of charged oxygen species across the semiconductor-dielectric interface, this approach modulates the local electronic structure of the channel, generating sufficient carriers for charge transport and activating oxygen-compensated thin films. The thin-film transistors (TFTs) investigated here depict an enhancement of linear mobility from 51 to 105.25 cm² V^-1 s^-1 (ionic-gated) and from 8.09 to 14.49 cm² V^-1 s^-1 (back-gated), by creating additional oxygen vacancies. The accompanying stochiometric transformations, monitored via spectroscopic measurements (X-ray photoelectron spectroscopy) corroborate the detailed electrical (TFT, current evolution) parameter analyses, providing critical insights into the underlying oxygen-vacancy generation mechanism and clearly demonstrating field-induced activation as a promising alternative to conventional high-temperature annealing strategies. Facilitating on-demand active programing of the operation modes of transistors (enhancement vs depletion), this technique paves way for facile fabrication of logic circuits and neuromorphic transistors for bioinspired computing.