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Updated: Jan 22, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Yiming Li1, Yu-Le Wu1,2, Philipp Hoess1,2
1European Molecular Biology Laboratory (EMBL), Cell Biology and Biophysics unit, Meyerhofstr. 1, 69117 Heidelberg, Germany.
Accurate 3D super-resolution microscopy is hindered by depth-induced aberrations. This study introduces a post-processing correction method to fix fitting errors, enabling precise z-localization even at large imaging depths.
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