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No-Reference Quality Assessment Method for Blurriness of SEM Micrographs with Multiple Texture
Hui Wang1, Xiaojuan Hu2, Hui Xu3
1School of Information and Control Engineering, China University of Mining and Technology, Xuzhou, China.
Abstract:
Scanning electron microscopy (SEM) plays an important role in the intuitive understanding of microstructures because it can provide ultrahigh magnification. Tens or hundreds of images are regularly generated and saved during a typical microscopy imaging process. Given the subjectivity of a microscopist's focusing operation, blurriness is an important distortion that debases the quality of micrographs. The selection of high-quality micrographs using subjective methods is expensive and time-consuming. This study proposes a new no-reference quality assessment method for evaluating the blurriness of SEM micrographs. The human visual system is more sensitive to the distortions of cartoon components than to those of redundant textured components according to the Gestalt perception psychology and the entropy masking property. Micrographs are initially decomposed into cartoon and textured components. Then, the spectral and spatial sharpness maps of the cartoon components are extracted. One metric is calculated by combining the spatial and spectral sharpness maps of the cartoon components. The other metric is calculated on the basis of the edge of the maximum local variation map of the cartoon components. Finally, the two metrics are combined as the final metric. The objective scores generated using this method exhibit high correlation and consistency with the subjective scores.
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