A One-step Residue-free Wet Etching Process of Ceramic PZT for Piezoelectric Transducers

Lead zirconate titanate (PZT) has wide applications in microelectromechanical systems (MEMS) due to its large piezoelectric coefficients. However, there exist serious issues during PZT wet etching even with multiple etching steps, such as residues on etching fronts and large undercut. In this paper, a one-step residue-free wet etching process of ceramic PZT is developed with fluoroboric acid. In this work, the design of experiments (DOE) method is employed to minimize undercut and residues without sacrificing etching rate. The acid concentration, temperature, and agitation are the process parameters considered in the DOE. Through DOE analysis of the experimental data, an optimal recipe is identified as the volume ratio of HBF₄:H₂O=1:10 at 23 °C. This new PZT etching recipe leads to a high etching rate (1.54 μm/min) with no observable residues and a small undercut (0.78:1) as well as a high selectivity over the photoresist (900:1). This etching recipe can be used for making various piezoelectric transducers.