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Published on: November 7, 2016
Mitigating Meniscus Instabilities in Solution-Sheared Polymer Films for Organic Field-Effect Transistors.
Cecilia Teixeira da Rocha, Ge Qu1, Xuegeng Yang2
1Department of Chemical and Biomolecular Engineering , University of Illinois Urbana-Champaign , 600 S. Mathews Avenue , Urbana , Illinois 61801 , United States.
Researchers developed a new coating method using high-frequency vibrations to improve solution shearing of semiconducting polymers. This technique enhances deposition speeds for organic electronics, overcoming limitations in large-scale device fabrication.
Area of Science:
- Materials Science
- Organic Electronics
- Polymer Chemistry
Background:
- Semiconducting donor-acceptor copolymers are key for solution-coated organic electronics.
- Optimal performance in organic field-effect transistors (OFETs) is achieved on low-surface-energy substrates.
- Coating instabilities on these substrates limit deposition speeds, hindering mass production.
Purpose of the Study:
- To enhance deposition speeds for solution shearing of semiconducting polymers.
- To overcome meniscus instabilities and "stick-and-slip" phenomena during coating.
- To enable upscaling of organic electronic device fabrication for commercial relevance.
Main Methods:
- Incorporation of a piezo crystal into the coating head.
- Utilizing high-frequency vibrations during the solution shearing process.
- Mitigating contact line instabilities by depinning the contact line.
Main Results:
- Successfully increased the accessible window of coating speeds.
- Suppressed the "stick-and-slip" phenomenon during deposition.
- Demonstrated a viable method for faster, large-scale fabrication of organic electronic devices.
Conclusions:
- The developed vibration-assisted coating method significantly improves solution shearing of semiconducting polymers.
- This advancement addresses critical limitations in upscaling organic electronic device manufacturing.
- The technique paves the way for more commercially viable organic electronic applications.
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Shearing Stress
The average shearing stress can be calculated by dividing the shear by the area of the cross-section.

