Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of
Jie Li1, Xingkang Yi1, Wenbo Hu2
1Key Laboratory for Physical Electronics and Devices of the Ministry of Education, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China.
Abstract:
For special instruments or equipments including particle accelerators, space microwave devices and spacecrafts, the suppression for electron-induced secondary electron emission (SEE) occurring on the component surfaces is of great significance due to a negative influence caused by SEE on their normal operations. In this paper, amorphous carbon (a-C) films were prepared on stainless-steel substrates by radio frequency magnetron sputtering, and the effects of substrate temperature (Ts) and continuous electron bombardment on the microstructure and secondary electron emission yield (SEY) of a-C film were investigated in order to achieve a better inhibition for SEE. The experimental results show that a rise of Ts during the a-C film preparation is conducive to a SEY reduction and an increase of multipactor threshold due to the increases of surface roughness and sp2 bond content. In addition, although the SEY of a-C film has a slight increase with the rise of electron bombardment time, the a-C film sample with a lower SEY keeps its lower SEY all the time during continuous electron bombardment. The a-C film prepared at Ts of 500 °C has the lowest SEY peak value of 1.09 with a reduction of 30.6% in comparison with the stainless-steel substrate.
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