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Updated: Jan 20, 2026

Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition
Published on: December 21, 2015
A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film
Yue Shi1, Liang He2, Fangcao Guang1
1School of Printing and Packaging Engineering, Beijing Institute of Graphic Communication, Beijing 102600, China.
Abstract:
Silicon oxynitride (SiNO) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiNO film. In particular, the preparation of SiNO film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.
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