Characterization of Shock-Sensitive Deposits from the Hydrolysis of Hexachlorodisilane

In this work, the shock sensitivity of hexachlorodisilane (HCDS) hydrolysis products was studied. The hydrolysis conditions included vapor and liquid HCDS hydrolysis in moist air. Shock sensitivity was determined by using a Fall hammer apparatus. Extensive infrared studies were done for the hydrolysis products. It was found that the Si-Si bond in HCDS during hydrolysis is preserved and can be cleaved by shock, leading to intramolecular oxidation of the neighboring silanol (Si-OH) groups to form a networked Si-O-Si structure and hydrogen gas. The limiting impact energy for shock sensitivity was also found proportional to the oxygen/silicon ratio in the deposit. Finally, recommendations are given for controlling the shock sensitivity of the hydrolyzed deposit.