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Updated: Jan 20, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Mechanistic Analysis of Embedded Copper Oxide in Organic Thin-Film Transistors with Controllable Threshold Voltage
Guozheng Nie1,2,3, Biao Dong1, Shaobing Wu1
1College of Mathematics and Statistics, Hunan University of Commerce, Changsha 410205, China.
Abstract:
The modulation of threshold voltage (V TH) of organic thin-film transistors (OTFTs) was investigated by embedding a thin CuO layer between the two semiconductor layers. The results showed that the V TH of OTFTs with a CuO layer can be effectively tuned by controlling the positive gate-to-source voltage (V GS0) under stress of gate-to-source voltages. The V TH shifts from -3.67 to -0.82 V when the positive V GS0 varies from 30 to 50 V. This can be explained by the mechanism of trapping electrons at the interface between the CuO charge-separation layer and the active layer. To confirm the role of the CuO layer acting as the charge-separation source, two organic thin-film diodes, indium-tin oxide(ITO)/tris (8-quinolinolato) aluminum(III) (Alq3)/pentacene/Al (inverted-stack diode) and ITO/Alq3/CuO/pentacene/Al (inverted-stack diode with a CuO layer), were fabricated and their diode current characteristics were measured. For the second device, a large current flow was observed at positive bias on the ITO electrodes, which is ascribed to the internal bipolar charge separation within the added CuO zone.
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