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Updated: Jan 20, 2026

Fabrication and Characterization of High-Q Silicon Nitride Membrane Resonators
Published on: August 8, 2025
A Silicon Resonant Accelerometer Embedded in An Isolation Frame with Stress Relief Anchor
Jian Cui1,2, Haibing Yang1, Dong Li1
1National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871, China.
Abstract:
Bias thermal sensitivity is a significant performance parameter of a silicon resonant accelerometer (SRA) and is normally used to evaluate the degree of engineering practicability. Theoretical analysis demonstrates that temperature-induced stress is the dominant factor that determines the bias temperature drift of the custom-designed SRA. To solve this issue, this paper presents an SRA embedded in an isolation frame with stress insensitive anchor that prevents the resonant beams suffering from the thermal stress along the sense axis and thus improving the bias stability. Moreover, a high sensitivity device is achieved by integrating the vibrating beams with the comb fingers without conventional additional mass design. The experimental results show that the nominal resonant frequency of the SRA is around 93 kHz with the sensitivity and nonlinearity of 223.7 Hz/g and 5.1‱. The thermal sensitivities of the two resonant beams are -27.6 ppm/°C and -28.8 ppm/°C, respectively, which can be considered as the results owing to temperature change of the Young's modulus without the thermal stress effect. The bias thermal sensitivity and the stability (1σ) after compensation are tested to be approximately 0.7 mg/°C and 1 mg over the temperature range from -40 °C to 60 °C with ±80 g measurement range.
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