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Computer Aided Patterning Design for Self-Assembled Microsphere Lithography (SA-MSL).

Rhiannon Lees1, Michael D Cooke2, Claudio Balocco2

  • 1Department of Engineering, Durham University, Durham, DH1 3LE, United Kingdom. rhiannon.lees@durham.ac.uk.

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|September 8, 2019
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Summary
This summary is machine-generated.

Optimizing microsphere dimensions in lithography enables new nanometer-scale features. Simulations reveal light leakage at sphere contact points creates star shapes, enhancing patterning resolution.

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Area of Science:

  • Nanotechnology
  • Optics
  • Materials Science

Background:

  • Self-assembled microsphere arrays are used in microsphere lithography for patterning.
  • Each sphere acts as a ball lens, focusing ultraviolet light onto photoresist.
  • Current techniques effectively pattern circular features.

Purpose of the Study:

  • To simulate near-field optical properties of microsphere arrays under incoherent light.
  • To investigate the generation of nanometer-scale features beyond simple circles.
  • To explore the impact of sphere dimensions and exposure conditions on patterning.

Main Methods:

  • Utilizing a finite difference time domain (FDTD) solver for optical simulations.
  • Modeling self-assembled microsphere arrays with varying dimensions.
  • Analyzing light propagation and focusing through the microsphere array.

Main Results:

  • Simulations demonstrate the formation of additional nanometer-scale features.
  • Light leakage through microsphere contact points is identified as the mechanism.
  • Hexagonally close-packed arrays produce distinct star-shaped features in photoresist.
  • These star features exhibit subfeature sizes approaching low-cost fabrication limits.

Conclusions:

  • Microsphere lithography can generate complex nanometer-scale patterns, not just circles.
  • Optimizing sphere geometry and exposure conditions is key to achieving finer features.
  • The contact point phenomenon offers a pathway to enhanced resolution in lithography.