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Updated: Jan 19, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Numerical analysis of a novel two-stage enlargement and adaptive correction approach for the annular aberration
Abstract:
The annular laser beam (ALB) is widely used in many fields, which could be affected by laser power and beam quality. To effectively and flexibly improve the beam quality of high-power large-aperture thin-wall ALB, a two-stage enlargement and adaptive correction configuration (TEACC) consisting of a novel outer-surface tubular deformable mirror (OTDM) and two extra prism groups (EPGs) is proposed in this paper. The correction principle and design principle of the TEACC are derived and analyzed. Based on the principle, a typical OTDM prototype and EPG structure are designed. Annular aberrations are compensated by applying the OTDM's influence functions and the least-square algorithm in simulation. The results show that the TEACC could perfectly compensate the wavefront distortions described by the 2nd to 36th order Zernike annular aberrations.
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