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Related Experiment Video

Updated: Jan 19, 2026

Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters
10:54

Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters

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Deep subwavelength lithography via tunable terahertz plasmons.

Jieyu You, Xiaodong Zeng, M Suhail Zubairy

    Optics Express
    |September 13, 2019
    PubMed
    Summary

    A novel optical lithography method uses tunable plasmons to surpass the diffraction limit, enabling subwavelength patterning with high resolution. This transistor-based approach achieves resolutions over 1/100 vacuum wavelength for 1D and simple 2D patterns.

    Area of Science:

    • Optics and Photonics
    • Nanotechnology
    • Semiconductor Physics

    Background:

    • The diffraction limit restricts resolution in conventional optical lithography.
    • Achieving deep subwavelength features is crucial for advanced microfabrication.
    • Plasmonics offers potential pathways to overcome optical limitations.

    Purpose of the Study:

    • To propose a novel scheme for optical lithography that overcomes the diffraction limit.
    • To demonstrate the generation and control of plasmons for high-resolution patterning.
    • To achieve resolutions beyond the conventional diffraction limit using a transistor-based approach.

    Main Methods:

    • Utilizing a current-driven instability to generate plasmons within a transistor.
    • Employing resonance amplification of plasmons between source and drain barriers.

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    Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography
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    Related Experiment Videos

    Last Updated: Jan 19, 2026

    Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters
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    Published on: July 8, 2013

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    Template Directed Synthesis of Plasmonic Gold Nanotubes with Tunable IR Absorbance
    13:37

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  • Controlling gate voltage to tune plasmon properties and achieve discrete deep subwavelength features.

    • Main Results:

    • Demonstrated a scheme to overcome the diffraction limit in optical lithography.
    • Achieved resolutions exceeding 1/100 of the vacuum wavelength.
    • Enabled the creation of arbitrary one-dimensional and simple two-dimensional patterns.
    • Operated within the linear optics regime.

    Conclusions:

    • The proposed scheme offers a viable method for high-resolution optical lithography.
    • Tunable plasmons generated in a transistor can be used for subwavelength patterning.
    • The technique is experimentally feasible and promises advancements in microfabrication.