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Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
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Comment on "Spin coating epitaxial films".

Chaojing Lu1, Lingli Tang2

  • 1College of Physics, State Key Laboratory of Bio-Fibers and Eco-Textiles, Qingdao University, Qingdao, Shandong 266071, China. cjlu@qdu.edu.cn.

Science (New York, N.Y.)
|September 14, 2019
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Summary
This summary is machine-generated.

This study challenges the claim of epitaxial inorganic films created by spin coating. Analysis of pole figures indicates a low percentage of epitaxial grains, suggesting the films are not truly epitaxial.

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Area of Science:

  • Materials Science
  • Crystallography

Background:

  • Spin coating is a method for depositing thin films.
  • Epitaxial growth requires a specific crystallographic orientation between film and substrate.

Purpose of the Study:

  • To re-evaluate the claim of epitaxial inorganic films produced by spin coating.
  • To determine the actual degree of epitaxy in films deposited by Kelso et al.

Main Methods:

  • X-ray diffraction (XRD) was used to analyze the crystallographic structure.
  • Pole figure analysis was employed to quantify the orientation of grains within the films.

Main Results:

  • The films contained only 4.1% to 25.5% epitaxial grains.
  • The calculated percentage of epitaxial grains indicates a lack of true epitaxial growth.

Conclusions:

  • The inorganic films deposited by spin coating, as reported by Kelso et al., cannot be considered epitaxial.
  • The findings suggest limitations of spin coating for achieving high-quality epitaxial growth in these materials.