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Engineering Surface Patterning of Colloidal Rings through Plateau-Rayleigh Instability.

Zhang Luo1,2, Jiajia Zhou3, Bing Liu1,2

  • 1Beijing National Laboratory for Molecular Sciences, State Key Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, China.

Angewandte Chemie (International Ed. in English)
|September 19, 2019
PubMed
Summary

The Plateau-Rayleigh instability on colloidal particles enables surface patterning of rings. Researchers controlled patch number and size on Janus rings and patchy disks, demonstrating tunable surface functionalization for complex colloids.

Keywords:
anisotropic colloidscolloidal ringsinstabilitypatchy colloidssurface patterning

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Area of Science:

  • Colloid and Surface Science
  • Materials Chemistry
  • Nanotechnology

Background:

  • Brownian colloidal particles exhibit Plateau-Rayleigh (P-R) instability.
  • This instability offers potential for surface patterning of colloidal structures.
  • Previous methods lacked precise control over patterned features.

Purpose of the Study:

  • To demonstrate the use of P-R instability for surface patterning of Brownian colloidal rings.
  • To investigate the tunability of patch number and size on synthesized colloidal particles.
  • To explore functionalization capabilities of the patterned surfaces.

Main Methods:

  • Synthesis of polystyrene(PS)/SiO2 core/shell rings with selective PS growth.
  • Initiation of P-R instability in ring dispersion using a good solvent for PS.
  • Combination of experimental studies and theoretical modeling.
  • Step-by-step polymerization for patch size control and ATRP grafting for functionalization.

Main Results:

  • Successfully patterned Brownian colloidal rings using P-R instability.
  • Demonstrated tunable patch number linearly related to solvent quantity and contact angle.
  • Synthesized one-patch Janus rings and patchy disks with high yields.
  • Achieved tunable patch sizes and demonstrated functionalization with pH-sensitive polymers.

Conclusions:

  • P-R instability is a viable method for controlled surface patterning of colloidal particles.
  • The number and size of surface patches are precisely tunable.
  • This approach facilitates the synthesis of complex patchy colloids with potential applications in advanced materials.