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Updated: Jan 6, 2026

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Roughness-dependent wetting behavior of vapor-deposited metallic thin films
Farnaz Foadi1, S Mehdi Vaez Allaei2, George Palasantzas3
1Supermaterials Research Laboratory (SRL), Department of Physics, University of Tehran, North Kargar Avenue, P.O. Box 14395-547, Tehran, Iran.
Abstract:
We studied the wetting behavior of silver and copper thin films versus their kinetic roughening upon deposition at room temperature on glass substrates. Time-dependent height-height correlation functions were extracted from atomic force microscopy images, and they demonstrated a nonstationary growth front of the film roughness associated with a temporal evolution of the local surface slope. As a result, we tried to correlate the roughness statistical properties such as the root-mean-square (rms) roughness σ, the correlation length ξ, and the local surface slope (ρ≈σ/ξ) with the wetting behavior of the films' surfaces. The contact angle behavior was also studied by analyzing the variation of the energy of the system with water penetrating into the surface cavities, and the associated Laplace pressure induced by the local surface curvature. Hence, it was demonstrated that the wetting transition from a metastable Cassie-Baxter state to a Wenzel state as well as the penetration of a droplet into the surface crevices occur at the smaller local surface slopes for the higher surface energy material.

