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Pulsed laser deposition with rapid beam deflection by a galvanometer mirror scanner
S Maruyama1, N Sannodo1, R Harada1
1Department of Applied Chemistry, Tohoku University, Sendai, Miyagi, 980-8579, Japan.
The Review of Scientific Instruments
|October 3, 2019
Summary
A novel rapid beam deflection system for pulsed laser deposition (PLD) significantly reduces target switching time from seconds to milliseconds. This advancement enables faster thin film fabrication and precise control over material composition.
Area of Science:
- Materials Science
- Thin Film Deposition
- Laser Technology
Background:
- Conventional pulsed laser deposition (PLD) systems require mechanical target switching, leading to significant time delays.
- Achieving precise control over thin film composition and structure can be challenging with conventional methods.
Purpose of the Study:
- To develop and demonstrate a rapid beam deflection pulsed laser deposition (RBD-PLD) system for efficient alternating ablation of multiple targets.
- To showcase the advantages of RBD-PLD in various thin film synthesis applications.
Main Methods:
- Implementation of a galvanometer mirror scanner for rapid laser beam deflection between fixed targets.
- Utilizing the RBD-PLD system for alternating deposition of different target materials.
Main Results:
- Reduced target switching time from several seconds to a few milliseconds.
- Demonstrated fast fabrication of binary alloy films and preparation of composition spread libraries.
- Investigated the impact of reduced switching time on volatile compound deposition and material mixing.
- Achieved efficient growth of compositionally graded thin films.
Conclusions:
- The RBD-PLD system offers a significant improvement over conventional PLD by drastically reducing switching times.
- This technology enables enhanced control over thin film properties, facilitating advanced materials synthesis.
