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Nanopillar Diffraction Gratings by Two-Photon Lithography.

Julia Purtov1,2, Peter Rogin3, Andreas Verch4

  • 1INM-Leibniz Institute for New Materials, Campus D2 2, 66123 Saarbrücken, Germany. julia-purtov@web.de.

Nanomaterials (Basel, Switzerland)
|October 23, 2019
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Summary

Researchers created defect-free nanopillar diffraction gratings using two-photon lithography. These 184 nm structures show potential for advanced optical applications, confirmed by simulations and microscopy.

Keywords:
direct laser writingnanostructuresoptical pillar gratingsphotonic crystalstwo-photon lithography

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Area of Science:

  • Photonics and Nanotechnology
  • Optical Engineering

Background:

  • Two-dimensional photonic structures, like nanostructured pillar gratings, are vital for applications in wave coupling, diffractive optics, and security.
  • Two-photon lithography offers a precise and reproducible method for fabricating complex nanostructured surfaces.

Purpose of the Study:

  • To fabricate nanopillar diffraction gratings using two-photon lithography.
  • To investigate the impact of laser power near the polymerization threshold on grating fabrication.
  • To analyze the structural and optical properties of the fabricated gratings.

Main Methods:

  • Fabrication of nanopillar gratings via two-photon lithography.
  • Varying laser powers close to the photoresist polymerization threshold.
  • Analysis using scanning electron microscopy (SEM) for structural characterization.
  • Optical microscopy for reflectivity analysis.
  • Comparison with Monte Carlo and rigorous coupled-wave simulations.

Main Results:

  • Achieved defect-free arrays of nanopillars with diameters as small as 184 nm.
  • Experimental results for structure sizes closely matched theoretical predictions from Monte Carlo simulations.
  • Optical reflectivity measurements were consistent with rigorous coupled-wave simulations.

Conclusions:

  • Two-photon lithography is effective for fabricating high-quality nanopillar diffraction gratings.
  • Precise control of laser power near the polymerization threshold is key to achieving defect-free structures.
  • The fabricated gratings exhibit predictable optical properties suitable for various photonic applications.