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Updated: Jan 5, 2026

Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
Published on: June 7, 2019
Twisted non-diffracting beams through all dielectric meta-axicons
Nasir Mahmood1, Heonyeong Jeong2, Inki Kim2
1Research Institute for Microwave and Millimeter-wave Studies (RIMMS), National University of Sciences and Technology (NUST), Islamabad 44000, Pakistan. farooq.tahir@seecs.edu.pk.
We developed efficient, polarization-insensitive meta-axicons using hydrogenated amorphous silicon (a-Si:H) to generate Bessel beams. This all-dielectric metasurface offers a cost-effective and CMOS-compatible platform for advanced optical applications.
Area of Science:
- Metasurfaces
- Nanophotonics
- Dielectric Metamaterials
Background:
- Bessel beams are of significant interest due to their non-diffractive properties and diverse applications.
- Existing methods for generating Bessel beams often require additional optical components, limiting miniaturization and integration.
Purpose of the Study:
- To demonstrate highly efficient, transmission-based, all-dielectric meta-axicons for generating Bessel beams.
- To investigate the tunability of Bessel beam characteristics (propagation length and beam width) via numerical aperture (NA).
- To highlight the advantages of hydrogenated amorphous silicon (a-Si:H) as a meta-material.
Main Methods:
- Fabrication and characterization of all-dielectric meta-axicons operating at a visible wavelength (633 nm).
- Utilized the finite difference time domain (FDTD) technique for numerical simulations.
- Experimental validation of simulated results.
Main Results:
- Achieved high efficiency (≈73.4%) and polarization-insensitive generation of Bessel beams.
- Demonstrated control over propagation length (∼2600 λ for NA = 0.1) and full width at half maximum (<0.5 λ for NA ≥ 0.7).
- Showed excellent agreement between FDTD simulations and experimental outcomes.
Conclusions:
- The developed a-Si:H meta-axicons provide an efficient, compact, and cost-effective platform for Bessel beam generation.
- The material choice offers advantages in fabrication, cost, and CMOS compatibility compared to plasmonic and other dielectric metasurfaces.
- This technology enables advanced applications in optical manipulation, alignment, laser machining, and imaging.
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