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Updated: Jan 5, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Photodetector based on heterostructure of two-dimensional WSe2/In2Se3
Bo Liu1, Bin Tang1, Fengjiao Lv1
1Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University, Beijing 100871, People's Republic of China.
Abstract:
Heterojunctions formed by two-dimensional (2D) layered semiconducting materials have been studied extensively in the past few years. These van der Waals (vdW) structures have shown great potential for future electronic and optoelectronic devices. However, the optoelectronic performance of these devices is limited by the indirect band gap of multilayer materials and low light absorption of single layer materials. Here, we fabricate photodetectors based on heterojunctions composed of n-type multilayer α-indium selenide (In2Se3) and p-type tungsten diselenide (WSe2) for the first time. The direct band gap of multilayer α-In2Se3 and type-II band alignment of the WSe2/In2Se3 heterojunction enable high optoelectronic performance of the devices at room temperature in the air. Without light illumination, the dark current is effectively suppressed to 10-13 A under -1 V bias and a high rectification ratio of 7.37 × 103 is observed. Upon laser illumination with a wavelength of 650 nm, the typical heterojunction device exhibits a photocurrent on/off ratio exceeding 1.24 × 105, a maximum photo responsivity of 26 mA W-1 and a short photoresponse time of 2.22 ms. Moreover, the heterojunction photodetectors show obvious light response in the wavelength range from 650 nm to 900 nm. The present 2D vdW heterojunctions composed of direct band gap multilayer materials show great potential for future optoelectronic devices.
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