Novel remapping approach for HR-EBSD based on demons registration
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Updated: Jan 4, 2026

High-resolution Episcopic Microscopy HREM - Simple and Robust Protocols for Processing and Visualizing Organic Materials
Published on: July 7, 2017
Chaoyi Zhu1, Kevin Kaufmann2, Kenneth S Vecchio3
1Materials Science and Engineering Program, UC San Diego, La Jolla, CA 92093, USA.
Abstract:
In this study, the possibility of utilizing a computer vision algorithm, i.e., demons registration, to accurately remap electron backscatter diffraction patterns for high resolution electron backscatter diffraction (HR-EBSD) applications is presented. First, the angular resolution of demons registration is demonstrated to be lower than the conventional cross-correlation based method, particularly at misorientation angles >0.157 rad. In addition, GPU acceleration has been applied to significantly boost the speed of iterative registration between a pair of patterns with 0.175 rad misorientation to under 1 s. Second, demons registration is implemented as a first-pass remapping, followed by a second pass cross-correlation method, which results in angular resolution of ~0.5 × 10-4 rad, a phantom stress value of ~35 MPa and phantom strain of ~2 × 10-4, on dynamically simulated patterns, without the need of implementing robust fitting or iterative remapping. Lastly, the new remapping method is applied to a large experimental dataset collected from an as-built additively-manufactured Inconel 625 cube, which shows significant residual stresses built-up near the large columnar grain region and regularly arranged GND structures.
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