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Multiple-field-point pupil wavefront optimization in computational lithography.

Tie Li, Yang Liu, Yiyu Sun

|November 2, 2019

Summary

This summary is machine-generated.

This study introduces a multiple-field-point pupil wavefront optimization (MPWO) method to enhance lithography imaging quality across the full field of view. MPWO improves imaging consistency and expands the process window for next-generation technology nodes.

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Area of Science:

Optical Engineering
Semiconductor Lithography

Background:

Existing pupil wavefront optimization (PWO) methods often neglect field-dependent wave aberrations in lithography systems.
Single field-of-view (FOV) PWO cannot adequately address the uneven impact of aberrations across the full FOV.

Purpose of the Study:

To develop a novel multiple-field-point PWO (MPWO) method for improving lithography imaging quality across the entire FOV.
To enhance the consistency and process window of lithography imaging for advanced technology nodes.

Main Methods:

A multiple-field-point cost function was designed to account for the varying effects of aberrations across the full FOV.
Simulations were conducted to evaluate the performance of the proposed MPWO method.

Main Results:

The MPWO method effectively improved the consistency of lithography imaging.
The overlapped process window for the full FOV was significantly enlarged.
Optimized wavefronts achieved through MPWO are compatible with the FlexWave pupil wavefront manipulator.

Conclusions:

The proposed MPWO method offers a viable solution for compensating field-dependent aberrations in lithography.
MPWO enhances overall lithography imaging performance and is crucial for next-generation semiconductor manufacturing.